名片曝光使用說(shuō)明

步驟1:創(chuàng)建名片

微信掃描名片二維碼,進(jìn)入虎易名片小程序,使用微信授權(quán)登錄并創(chuàng)建您的名片。

步驟2:投放名片

創(chuàng)建名片成功后,將投放名片至該產(chǎn)品“同類(lèi)優(yōu)質(zhì)商家”欄目下,即開(kāi)啟名片曝光服務(wù),服務(wù)費(fèi)用為:1虎幣/天。(虎幣充值比率:1虎幣=1.00人民幣)

關(guān)于曝光服務(wù)

名片曝光只限于使用免費(fèi)模板的企業(yè)產(chǎn)品詳細(xì)頁(yè)下,因此當(dāng)企業(yè)使用收費(fèi)模板時(shí),曝光服務(wù)將自動(dòng)失效,并停止扣除服務(wù)費(fèi)。

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CSL系列是簡(jiǎn)潔、一體化的設(shè)備,它將UV處理器和電器控制柜融合在一起。CSL系列是簡(jiǎn)潔、一體化的設(shè)備,它將UV處理器和電器控制柜融合在一起。CSL主要安裝在室內(nèi)和操作控制室內(nèi)。它主要運(yùn)用于實(shí)驗(yàn)室、醫(yī)院、酒店,同時(shí)也適用于化妝品、醫(yī)藥、半導(dǎo)體制造領(lǐng)域。CSL系列使用十一支模管,流量從9.1-143.2 m3/hr。 The Aquafine CSL Series features a compact design that incorporates a UV treatment chamber with an electrical cabinet base that contains all electrical components and instrumentation. These compact, one-piece UV models are engineered for indoor installations and controlled operating environments. The CSL series is used in laboratory, hospital, and hotel installations, as well as cosmetic, pharmaceutical and semiconductor manufacturing processes. UV disinfection flow rates for the eleven standard CSL models range from 40 to 630 U.S. GPM (9.1 to 143.2 m3/hr.), with TOC reduction and ozone destruction configurations also available. Specifications, features and options for each ultraviolet treatment model are listed on the back of this sheet. FEATURES AND OPTIONS • CE Listed• 316L Stainless Steel Treatment Chamber• 304 Stainless Steel Cabinet Housing• Optional Ra 15 (240 grit) Internal Finish• Optional Endplate-Mounted 360° UV Intensity Sensor• Optional 4-20 mA Output Signal• Optional Temperature Safety Control• Optional Lamp Out Alert Circuit• Optional Sanitary Inlet & Outlet Fittings• Optional High Pressure Modification For more information or to place an order, contact our Customer Service Department or your local Aquafine representative. CSL (INDOOR) SERIES SPECIFICATIONS 1 eights shown are approximate and will vary according to power requirements and specified options.2 ANSI Class 150 flange.3 Must be ordered with S-254 UV Optical Sensor option.4 After 8,000 hours of operation at 254 nanometers.
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